Substrate processing apparatus
AssigneeSemes Co., Ltd.
InventorsSUNGIK PARK, Yongsu Jang, Seungpil Chung, Jungyoon Yang, Inseong Lim
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AssigneeSemes Co., Ltd.
InventorsSUNGIK PARK, Yongsu Jang, Seungpil Chung, Jungyoon Yang, Inseong Lim
Estimating the term…
A substrate processing apparatus includes a process chamber including a processing space, a heater located inside the process chamber and configured to heat a lower portion of the processing space, and a first heat source located inside the process chamber and spaced apart from the heater and configured to heat an upper portion of the processing space, a plurality of first protrusions protruding in a vertical direction from an upper surface of the heater, and a second protrusion protruding in the vertical direction from an edge portion of the upper surface of the heater.
A substrate processing apparatus comprising:
A substrate processing apparatus comprising:
A substrate processing apparatus comprising:
Dependencies are inferred from the claim text.