Substrate processing device

Abstract

Disclosed is a substrate processing apparatus having a symmetrical reaction space in which a process is performed after a substrate is transferred into the reaction space. The substrate processing apparatus may include: a chamber including a reaction space having an opening formed at one or more sidewalls; and a valve configured to open/close the opening. The valve may include: a blade housed in the chamber including the sidewall and a chamber bottom, which form the reaction space, and configured to open/close the opening; and a driving unit configured to raise and lower the blade, wherein one surface of the blade is formed as the same plane as the inner surface of the chamber by the closing of the opening.

Dependencies are inferred from the claim text.