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US 2024/0201604 A1Published application
Euv lithography system comprising a gas-binding component in the form of a foil
AssigneeCarl Zeiss SMT GmbH
InventorRalf WICHARD
Life of this patent
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Abstract
An EUV lithography system (1) including: a housing (26), at least one reflective optical element (M1, M2) disposed within an interior (27) of the housing (26), and at least one gas-binding component (31a-c) having a gas-binding material for binding gaseous contaminating substances (29) present in the interior (27). The gas-binding component is formed as a foil (31a-c) and a coating (33, 33a,b) containing the gas-binding material is applied on at least one side (32a, 32b) of the foil (31a-c).
Claims12
An extreme ultraviolet (EUV) lithography system, comprising:
- a housing having an interior,
- at least one reflective optical element disposed within the interior of the housing, and
- at least one gas-binding component having a gas-binding material for binding of gaseous contaminating substances present in the interior,
- wherein the gas-binding component is configured as a foil, wherein a coating containing the gas-binding material is applied on at least one side of the foil, and wherein the foil has a thickness between 1 μm and 1 mm.
1 more element
Dependencies are inferred from the claim text.