Substrate processing apparatus

A substrate processing apparatus comprising a chemical liquid processing apparatus configured to perform processing on substrates, wherein the chemical liquid processing apparatus includes:

• a first chemical liquid processing part configured to supply a first chemical liquid to the substrates and perform first chemical processing on the substrates;
• a second chemical liquid processing part configured to be stacked with the first chemical liquid processing part and to supply a second chemical liquid to the substrates and perform second chemical processing on the substrates;
• a heating processing part located opposite the first chemical liquid processing part and the second chemical liquid processing part and configured to perform a heating treatment operation on the substrates before and after the first chemical processing on the substrates or the second chemical processing on the substrates;
• a substrate transferring part located between the first and second chemical liquid processing parts and the heating processing part, wherein the substrate transferring part is configured to have:
• at least two first robots, at least one second robot and at least one third robot, all of which are arranged in parallel layers, the at least two first robots are configured to transfer the substrates between the first chemical liquid processing part and the heating processing part and the at least one third robot is configured to transfer the substrates between the second chemical liquid processing part and the heating processing part;
• and
• at least one pair of first buffer units located between two adjacent first robots and configured for loading and unloading the substrates therein and therefrom via the at least one second robot.