Method for inspecting resist composition, method for producing resist composition, and resist composition

Abstract

Provided is a method for inspecting a resist composition, the method being able to easily determine a resist composition whose LWR performance after storage for a predetermined period of time is good. Also provided are a method for producing a resist composition and a resist composition. The method for inspecting a resist composition is a method for inspecting a resist composition with which a resist pattern can be formed by performing an exposure treatment and a development treatment using a first developer. The method has a step A1 of forming a resist film on a substrate using the resist composition, a step B1 of exposing the resist film, a step C1 of bringing a second developer that dissolves the resist film at a higher rate than the first developer into contact with the resist film, a step X1 of acquiring specific measurement data, and a step Y1 of determining whether the measurement data falls within a preset allowable range. Alternatively, the method has a step A2 of forming a resist film on a substrate using the resist composition, a step C2 of bringing a second developer into contact with the resist film, a step X2 of acquiring specific measurement data, and a step Y2 of determining whether the measurement data falls within a preset allowable range.

Dependencies are inferred from the claim text.