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US 2024/0201597 A1Published application
Duv lithography system
OwnerStephan Sixinventor
Life of this patent
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Abstract
A DUV lithography apparatus comprises: a light source for generating DUV radiation at at least one operating wavelength in the DUV wavelength range; a photomask; and an optical element which transmits the DUV radiation and is spaced apart from the photomask and to which an absorbent coating is applied. The absorbent coating has absorbent microstructures which cover a surface region to which the absorbent coating is applied with a surface area proportion of less than 0.1% and optionally more than 0.01%.
Claims20
An optical arrangement, comprising:
- a light source configured to generate radiation at an operating wavelength in the DUV wavelength range;
- an optical element configured to transmit radiation at the operating wavelength;
- and
- a heating device comprising a heating source configured to radiate heating radiation,
- wherein:
- the optical element comprises a surface region;
- an absorbent coating is disposed on the surface region;
- the absorbent coating comprises absorbent microstructures;
- the absorbent microstructures cover less than 0.1% of the surface region;
- and
- the heating light device is configured to radiate the heating radiation onto the surface region.
8 more elements
Dependencies are inferred from the claim text.