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US 2024/0201588 A1Published application
Organic salt, photoresist composition including the same, and pattern formation method using the same
AssigneeSamsung Electronics Co., Ltd.
InventorsHana KIM, Beomseok KIM, Kyuhyun IM, Yoonhyun KWAK, Hyeran KIM
Life of this patent
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Abstract
Provided are an organic salt represented by Formula 1, a photoresist composition including the same, and a pattern method using the same: wherein X+, Y−, and R11 to R13 in Formula 1 are understood by referring to the specification.
Claims20
An organic salt represented by Formula 1:
- wherein, in Formula 1,
- X+ is Se+ or Te+;
- R11 to R13 are each independently a linear, branched, or cyclic C1-C20 monovalent hydrocarbon group which optionally includes a heteroatom;
- at least one of R11 to R13 includes at least one iodine (I);
- adjacent two of R11 to R13 are optionally bonded to each other to form a ring;
- and
- Y− is a counter anion.
4 more elements
Dependencies are inferred from the claim text.