Photoresist formulations 3d microprinting techniques
AssigneeFondazione Istituto Italiano Di Tecnologia
InventorsMarco Carlotti, Omar Tricinci, Virgilio Mattoli
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AssigneeFondazione Istituto Italiano Di Tecnologia
InventorsMarco Carlotti, Omar Tricinci, Virgilio Mattoli
Estimating the term…
The present invention fits into the 3D microprinting sector and relates to a process for producing degradable 3D polymeric nano- or microstructures having sub-micrometre resolution. The process of the invention uses a photoresist formulation comprising a mixture of: (i) cyclic ketene acetal monomers; (ii) vinyl and/or (meth)acrylic monomers; and (iii) at least one photoinitiator. The process of the invention is based on two-photon polymerisation photoinitiated by focusing a laser beam within said photoresist formulation, with the obtainment of polymeric nano- or microstructures degradable under mild conditions and having sub-micrometre resolution.
3D micro-printing process via two-photon polymerisation for producing degradable 3D polymeric nano- or microstructures having sub-micrometre resolution, said process comprising the steps of:
Photoresist formulation comprising:
-19. (canceled)
Dependencies are inferred from the claim text.