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US 2024/0201486 A1Published application
Controlling aberration in an optical system, a metrology system, lithographic apparatus, and methods thereof
AssigneeASML Netherlands B.V.
InventorsKrishanu SHOME, Scott Douglas COSTON, Kan DU
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Abstract
A method includes determining optical aberrations of an optical system, identifying an illumination profile that compensates for the optical aberrations of the optical system, and curing a layer of optical cement of an optical device using a modulated energy beam to achieve the identified illumination profile.
Claims18
A method, comprising:
- determining optical aberrations of an optical system;
- identifying, using processing circuitry, an illumination profile that compensates for the optical aberrations of the optical system;
- and
- curing a layer of optical cement of an optical device using a modulated energy beam to achieve the identified illumination profile.
1 more element
A system, comprising:
- an optical system having an optical device;
- a processor configured to
- determine optical aberrations of the optical system, and
- identify an illumination profile that compensates for the optical aberrations of;
- and
- an illumination system configured to
- generate an energy beam,
- modulate the energy beam with the illumination profile, and
- cure a layer of optical cement of the optical device of the optical system with the energy beam.
6 more elements
Dependencies are inferred from the claim text.