Particle analysis system and particle analysis method
AssigneeSony Group Corporation
InventorsTOMOYUKI UMETSU, NAOKI IDE
Life of this patent
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AssigneeSony Group Corporation
InventorsTOMOYUKI UMETSU, NAOKI IDE
Estimating the term…
A measurement spectrum obtained by irradiating a particle labeled with a plurality of fluorescent dyes with excitation light is separated for each fluorescent dye with high accuracy. Provided is a particle analysis system (1) including a plurality of photodetectors (23) configured to acquire light generated by irradiating a particle labeled with a plurality of fluorescent dyes with excitation light; and an information processing unit (132) configured to calculate fluorescence intensity of each fluorescent dye by performing separation processing on a measurement spectrum based on measured values from the plurality of photodetectors (23) with a single staining spectrum of each fluorescent dye, in which the separation processing is performed by using a weighted least squares method (WLSM) including a weight determined based on a variation in the measured values.
A particle analysis system including:
A particle analysis method including:
Dependencies are inferred from the claim text.