Method of performing cleaning and apparatus for performing substrate processing

An apparatus for performing a processing of a substrate, comprising:

• a processing container provided in a space where the processing is performed;
• a stage arranged inside the processing container to place the substrate on the stage;
• a processing gas supplier configured to supply, to the processing container, a processing gas for processing the substrate;
• a cleaning gas supplier configured to supply, to the processing container, a cleaning gas for removing a deposition film deposited on a surface of a device arranged inside the processing container during the processing of the substrate;
• a heating-film raw material gas supplier configured to supply, to the processing container, a heating-film forming gas for forming a heating film that undergoes a temperature increase due to a reaction heat generated when being removed by a reaction with the cleaning gas;
• and
• a controller,
• wherein the controller is configured to output a control signal for executing:
• a step of forming the heating film on an upper surface of the deposition film by supplying the heating-film forming gas before performing the cleaning by supplying the cleaning gas to the deposition film;
• a step of supplying the cleaning gas to the heating film to remove the heating film, and heating the deposition film on a lower surface of the heating film by the temperature increase;
• and
• a step of performing the cleaning by supplying the cleaning gas to the deposition film having an increased temperature in the step of heating the deposition film after the heating film is removed.