Shower head and substrate processing apparatus including the shower head

A shower head comprising:

• a lower shower head part;
• and
• an upper shower head part on the lower shower head part,
• wherein the lower shower head part comprises:
• a lower plate that comprises a plurality of gas holes;
• and
• at least one supporting pillar extended from a top surface of the lower plate and coupled to the upper shower head part,
• wherein the plurality of gas holes comprises:
• a vertical hole penetrating the lower plate in a first direction;
• and
• an inclined hole penetrating the lower plate and spaced apart from the vertical hole,
• wherein an upper end of the inclined hole, which meets the top surface of the lower plate, is beside the at least one supporting pillar, and
• wherein a lower end of the inclined hole, which meets a bottom surface of the lower plate, is below the at least one supporting pillar.

A substrate processing apparatus comprising:

• a shower head,
• wherein the shower head comprises a lower shower head part,
• wherein the lower shower head part comprises:
• a lower plate that comprises a plurality of gas holes;
• and
• a supporting pillar extended upward from a top surface of the lower plate,
• wherein the lower plate comprises:
• at least one supporting portion which at least partially overlaps the supporting pillar, in a plan view;
• and
• a distribution portion which does not overlap the supporting pillar and is beside the at least one supporting portion, in a plan view,
• wherein the plurality of gas holes comprises:
• a first gas holes in the distribution portion and arranged in a first pattern on a top surface of the distribution portion,
• a second gas holes in the distribution portion and arranged in the first pattern on a bottom surface of the distribution portion,
• a third gas holes in the at least one supporting portion and arranged in a second pattern on a top surface of the at least one supporting portion, the second pattern being different from the first pattern, and
• a fourth gas holes in the at least one supporting portion and arranged in the first pattern on a bottom surface of the at least one supporting portion.