Semiconductor processing device
AssigneeASM IP Holding B.V.
InventorsJereld Lee Winkler, Eric James Shero, Carl Louis White, Shankar Swaminathan, Bhushan Zope
Life of this patent
Estimating the term…
Abstract
A semiconductor processing device is disclosed. The device can include a reactor and a solid source vessel configured to supply a vaporized solid reactant to the reactor. A process control chamber can be disposed between the solid source vessel and the reactor. The device can include a valve upstream of the process control chamber. A control system can be configured to control operation of the valve based at least in part on feedback of measured pressure in the process control chamber.
Claims20
A semiconductor processing device comprising:
- a reactor;
- a vessel configured to supply a vaporized reactant to the reactor;
- a process control chamber in fluid communication with the vessel and the reactor between the vessel and the reactor, wherein the process control chamber is configured to collect vaporized reactant before being delivered to the reactor;
- a process control valve upstream of the process control chamber between the vessel and the process control chamber;
- a pressure transducer configured to measure the pressure in the process control chamber;
- and
- a control system configured to receive a signal from the pressure transducer indicating a measured pressure in the process control chamber.
A semiconductor processing device comprising:
- a vessel disposed in a first thermal zone at a first temperature, wherein the vessel is configured to supply a reactant;
- a process control chamber downstream of and in fluid communication with the vessel, the process control chamber disposed in a second thermal zone at a second temperature that is higher than the first temperature and configured to collect and transfer the reactant to a reactor downstream of the process control chamber;
- and
- a process control valve upstream of the process control chamber and disposed in the second thermal zone between the vessel and the process control chamber.
A method of delivering a reactant vapor to a reaction chamber, the method comprising:
- providing a reactant vapor in a vessel;
- transferring the reactant vapor from the vessel to a process control chamber;
- collecting the reactant vapor in the process control chamber;
- measuring the pressure of the reactant vapor in the process control chamber;
- and
- transferring the reactant vapor from the process control chamber to a reaction chamber.
Dependencies are inferred from the claim text.