Carboxylate salt, photoresist composition including the same, and method of forming pattern using the photoresist composition

A carboxylate salt represented by Formula 1:

• wherein, in Formula 1,
• A11 is a C1-C30 cyclic hydrocarbon group that optionally includes a heteroatom,
• L11 and L12 are each independently a single bond or a divalent linking group,
• a11 and a12 are each independently an integer from 0 to 4,
• R11 to R13 are each independently hydrogen, deuterium, a halogen, a cyano group, a hydroxy group, a linear, branched, or cyclic C1-C20 monovalent hydrocarbon group that optionally includes a heteroatom, or —N(Q1)(Q2),
• Q1 and Q2 are each independently hydrogen, deuterium, a linear, branched, or cyclic C1-C20 monovalent hydrocarbon group that optionally includes a heteroatom,
• b13 is an integer from 0 to 10,
• an adjacent two of R11, R12, R13, L11, and L12 are optionally bonded to each other to form a ring,
• an adjacent two of a plurality of R13 are optionally bonded to each other to form a ring,
• n11 and n12 are each independently an integer from 1 to 10, and
• M+ is a counter cation.