Post baking apparatus

A post baking apparatus comprising:

• a baking chamber configured to receive a substrate with an exposed photoresist film;
• a lower heater in the baking chamber under the substrate to heat the exposed photoresist film;
• a lower electrode under the lower heater;
• an upper electrode over the substrate to form an electric field from the lower electrode to the upper electrode along a vertical direction;
• a coil on an inner sidewall of the baking chamber to form a magnetic field from the upper electrode to the lower electrode along the vertical direction;
• and
• a controller configured to control operations of the lower heater, the lower electrode and the coil.

A post baking apparatus comprising:

• a baking chamber configured to receive a substrate with an exposed photoresist film;
• a lower heater in the baking chamber under the substrate to heat the exposed photoresist film;
• a lower electrode under the lower heater;
• an upper electrode over the substrate to form an electric field from the lower electrode to the upper electrode along a vertical direction;
• a coil on an inner sidewall of the baking chamber to form a magnetic field from the upper electrode to the lower electrode along the vertical direction;
• an upper heater over the substrate;
• and.
• a controller configured to control operations of the lower heater, the lower electrode, the coil and the upper heater,
• wherein the controller controls an impulse of the lamp heater.