Semiconductor structure and method for forming the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJEN-YUAN CHANG, CHIA-PING LAI
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsJEN-YUAN CHANG, CHIA-PING LAI
Estimating the term…
The semiconductor structure includes a die, a dielectric layer surrounding the die, a photoelectric device disposed adjacent to the die and surrounded by the dielectric layer, a first opening extending through the redistribution layer and configured to receive a light-conducting member, and a metallic shield extending at least partially through the redistribution layer and surrounding the first opening. A method for forming a semiconductor structure includes receiving a die; forming a dielectric layer to surround the die; and disposing a photoelectric device surrounded by the dielectric layer; forming a redistribution layer over the die, the dielectric layer and the photoelectric device; and removing a portion of the redistribution layer to form a first opening over the photoelectric device. A metallic shield extending at least partially through the redistribution layer and surrounding the first opening is formed during the formation of the redistribution layer.
A method for forming a semiconductor structure, comprising:
A method for forming a semiconductor structure, comprising:
A method for forming a semiconductor structure, comprising:
Dependencies are inferred from the claim text.