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US 2024/0192262 A1Published application
Method of analyzing semiconductor structure
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYI MIN LIU, CHIEN-YI CHEN, YIAN-LIANG KUO
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Abstract
A method includes providing a detector disposed above a semiconductor structure; identifying a portion of the semiconductor structure at a temperature substantially greater than a predetermined threshold by the detector, rotating the stage; and deriving a position of the portion of the semiconductor structure based upon the rotation of the stage.
Claims20
A method, comprising:
- identifying a portion of the semiconductor structure at a temperature substantially greater than a predetermined threshold by a detector;
- rotating the semiconductor structure;
- and
- deriving a position of the portion of the semiconductor structure based upon the rotating the semiconductor structure.
1 more element
A method, comprising:
- applying a voltage to a semiconductor structure and identifying a portion of the semiconductor structure at a temperature substantially greater than a predetermined threshold by a detector;
- rotating the detector around the semiconductor structure;
- and
- deriving a position of the portion of the semiconductor structure based upon the rotating the detector.
1 more element
A method, comprising:
- providing a detector and a semiconductor structure;
- identifying a portion of the semiconductor structure at a temperature substantially greater than a predetermined threshold by the detector;
- rotating the semiconductor structure;
- rotating the detector about the semiconductor structure;
- and
- deriving a position of the portion of the semiconductor structure based upon the rotating the semiconductor structure and the rotating the detector.
3 more elements
Dependencies are inferred from the claim text.