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US 2024/0191360 A1Published application
Chemical solution for removing precious metal, method for manufacturing chemical solution, method for treating substrate, method for manufacturing semiconductor device
AssigneeTokyo Ohka Kogyo Co., Ltd.
InventorKazuhiro TAKAHASHI
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Abstract
A chemical solution for removing a precious metal includes a cerium-containing oxidizing agent (A), an acid component (B) that is two or more acid components having different pKa's one another, provided that perchloric acid is excluded, and water.
Claims8
A chemical solution for removing a precious metal, the chemical solution comprising:
- a cerium-containing oxidizing agent (A);
- an acid component (B) that is two or more acid components having different pKa's one another, provided that perchloric acid is excluded;
- and
- water.
1 more element
Dependencies are inferred from the claim text.