Method for manufacturing nanostructure and nanostructure

A method for manufacturing a nanostructure, comprising:

• providing a substrate;
• alternately and periodically stacking a first material layer and a second material layer on the substrate to form a stacked layer, wherein an etching selection ratio between the first material layer and the second material layer is not equal to 1;
• forming a mask on an upper surface of the stacked layer and forming a slot pattern in the mask, wherein the slot pattern comprises a plurality of parallel slots, and a bottom of each slot is defined by the upper surface of the stacked layer;
• etching the stacked layer from top to bottom, to an upper surface of the substrate, so as to transfer the slot pattern to the stacked layer;
• filling the slot pattern in the stacked layer with a molding material, and planarizing the molding material to the upper surface of the stacked layer;
• and
• removing the first material layer or the second material layer left in the stacked layer, so as to form nanopores arranged in an array in the stacked layer.