Backplane and method for manufacturing the same, backlight module, and display apparatus

A method for manufacturing a backplane, comprising:

• providing a substrate;
• forming a circuit structure layer on a side of the substrate;
• forming a reflective layer on a side of the circuit structure layer away from the substrate;
• the reflective layer including a plurality of first through holes arranged at intervals;
• mounting a plurality of electronic devices in the plurality of first through holes, respectively;
• each electronic device being located in a first through hole in the plurality of first through holes, and the plurality of electronic devices being electrically connected to the circuit structure layer;
• and
• forming a plurality of encapsulation portions on a side of the plurality of electronic devices away from the substrate, each encapsulation portion covering an electronic device in the plurality of electronic devices;
• wherein a conductive layer in the circuit structure layer farthest from the substrate includes a plurality of first conductive lines, and at least one first conductive line includes a first linear extending portion, a second linear extending portion and a third linear extending portion that are sequentially connected;
• an orthographic projection of the first linear extending portion on the substrate is a first orthographic projection, an orthographic projection of the second linear extending portion on the substrate is a second orthographic projection, an orthographic projection of the third linear extending portion on the substrate is a third orthographic projection, and an orthographic projection of an encapsulation portion in the plurality of encapsulation portions on the substrate is a fourth orthographic projection;
• the first orthographic projection is located within the fourth orthographic projection, the second orthographic projection is partially overlapped with the fourth orthographic projection, and the third orthographic projection is located outside the fourth orthographic projection;
• two endpoints of the fourth orthographic projection that are farthest from each other in a width direction of the second linear extending portion are first endpoints;
• and
• a distance between the second orthographic projection and each of first reference lines, which respectively pass through the first endpoints and are parallel to the second linear extending portion, is not less than half of a line width of the second linear extending portion.