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AssigneeAmosense Co., Ltd.
InventorsJi Hyung LEE, Kyung Whan WOO, Byoung Su JIN, Young Jun AN
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An electrostatic chuck is provided. An electrostatic chuck is implemented by comprising a silicon nitride sintered body and an electrostatic electrode embedded in the silicon nitride sintered body. Therefore, the electrostatic chuck includes a ceramic sintered body, which is silicon nitride, to have excellent plasma resistance, chemical resistance and thermal shock resistance while exhibiting heat dissipation performance of a level equivalent or similar to that of an aluminum nitride ceramic sintered body, which has been conventionally and widely used, and thus can be widely used in a semiconductor process.
An electrostatic chuck, comprising:
An electrostatic chuck heater having a first surface on which a wafer is adsorbed and a second surface opposing the first surface, the electrostatic chuck heater comprising:
Dependencies are inferred from the claim text.