Method of Conductive Material Deposition
AssigneeTokyo Electron Limited
InventorsHirokazu Aizawa, Kai-Hung Yu, Nicholas Joy, Yusuke Yoshida, Kandabara Tapily
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AssigneeTokyo Electron Limited
InventorsHirokazu Aizawa, Kai-Hung Yu, Nicholas Joy, Yusuke Yoshida, Kandabara Tapily
Estimating the term…
A method for processing a substrate that includes: depositing a filling material over the substrate including a first recess and a second recess, the filling material filling the first recess and the second recess; patterning the filling material such that the first recess is reopened while the second recess remains filled with the filling material; filling the first recess with a conductive material to a first height; etching the filling material selectively to the conductive material to reopen the second recess; filling a remainder of the first recess and the second recess with the conductive material; and performing an etch back process to etch the conductive material such that the first recess and the second recess are filled with the conductive material to a second height.
A method for processing a substrate, the method comprising:
A method for processing a substrate, the method comprising:
A method for processing a substrate, the method comprising:
Dependencies are inferred from the claim text.