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US 2024/0177994 A1Published application
Photomask pellicle and method of forming the same
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsYUN-YUE LIN, CHEN-CHIEH YU
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Abstract
A first capping layer is deposited over a substrate. A first capping layer is deposited over a substrate. A network of nanowires is grown over the first capping layer. A second capping layer is deposited over the network of nanowires. The substrate is etched to expose the first capping layer. The first capping layer and the second capping layer are thinned around the nanowires to form a coating on the nanowires.
Claims20
A method, comprising:
- depositing a first capping layer over a substrate;
- growing a network of nanowires over the first capping layer;
- depositing a second capping layer over the network of nanowires;
- etching the substrate to expose the first capping layer;
- and
- thinning the first capping layer and the second capping layer around the nanowires to form a coating on the nanowires.
3 more elements
A method, comprising:
- depositing a first capping layer over a substrate;
- growing a network of nanowires over the first capping layer;
- depositing a second capping layer over the network of nanowires, wherein the first capping layer and the second capping layer encapsulate the nanowires;
- and
- etching the first capping layer and the second capping layer to form a coating, from the first capping layer and the second capping layer, on a first portion of the nanowires, wherein a plurality of gaps are formed between the nanowires.
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A photomask pellicle, comprising:
- a frame defining an interior space;
- and
- a membrane coupled to the frame and comprising:
- a network of nanowires, wherein the nanowires cross each other;
- and
- a protection material formed on the network of nanowires, wherein the protection material comprises:
- a first portion serving as the frame to encapsulate the network of nanowires;
- and
- a second portion within the interior space, wherein the protection material forms a coating on the network of nanowires and conformal to a circumference of each of the nanowires.
6 more elements
Dependencies are inferred from the claim text.