Imprint apparatus, article manufacturing method, determination method, and recording medium
AssigneeCanon Kabushiki Kaisha
InventorKEIJI YAMASHITA
Life of this patent
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AssigneeCanon Kabushiki Kaisha
InventorKEIJI YAMASHITA
Estimating the term…
An imprint apparatus that performs an imprint process of forming a pattern on an imprint material supplied on a substrate by bringing the imprint material into contact with a mold. The imprint apparatus includes a holding unit configured to hold the substrate, a supply unit configured to supply a droplet of the imprint material to the substrate in a partial region, the partial region including an edge of the substrate and with which a part of a pattern region of the mold is to come into contact in the imprint process, and a control unit configured to determine a position or an amount of the droplet of the imprint material to be supplied to the partial region, based on measurement data on a surface height of the partial region in a state in which the holding unit holds the substrate.
An imprint apparatus that performs an imprint process of forming a pattern on an imprint material supplied on a substrate by bringing the imprint material into contact with a mold, the imprint apparatus comprising:
An imprint apparatus that performs an imprint process of forming a pattern on an imprint material supplied on a substrate by bringing the imprint material into contact with a mold, the imprint apparatus comprising:
A method of manufacturing an article, the method comprising:
A method of manufacturing an article, the method comprising:
A method for determining a position or an amount of a droplet of an imprint material to be supplied to a substrate for an imprint process in which the imprint material is supplied to the substrate, and the imprint material on the substrate is brought into contact with a mold to form a pattern on the imprint material, the method comprising:
A non-transitory computer-readable recording medium storing a program for causing a computer to execute a method for determining a position or an amount of a droplet of an imprint material to be supplied to a substrate, the method being for determining the position or the amount of the droplet of the imprint material to be supplied to the substrate for an imprint process in which the imprint material is supplied to the substrate, and the imprint material on the substrate is brought into contact with a mold to form a pattern on the imprint material, the method comprising:
Dependencies are inferred from the claim text.