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US 2024/0175773 A1Published application
Distortion resistance film and pressure sensor
AssigneeTDK Corporation
InventorsKohei NAWAOKA, Ken UNNO, Tetsuya SASAHARA, Masanori KOBAYASHI
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Abstract
A distortion resistance film is capable of reducing a property change accompanying a composition change and a pressure sensor uses the distortion resistance film. The distortion resistance film is represented by a formula Cr100-x-yAlxNy, in which composition regions of x and y satisfy 25<x≤50 and 0.1<y≤20, respectively.
Claims6
A distortion resistance film comprising a composition represented by a formula Cr100-x-yAlxNy, wherein composition regions of x and y satisfy 25<x≤50 and 0.1<y≤20, respectively.
Dependencies are inferred from the claim text.