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US 2024/0175122 A1Published application
Film forming method and film forming apparatus
AssigneeTokyo Electron Limited
InventorsSatoshi ONODERA, Yamato TONEGAWA, Jun OGAWA
Life of this patent
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Abstract
A film forming method includes a) supplying raw material gas to a substrate, thereby adsorbing the raw material gas to the substrate, the raw material gas having, in a molecule thereof, a cyclic structure including a silicon atom and a carbon atom, b) thermally treating the substrate in an atmosphere including nitriding gas, thereby thermally nitriding the raw material gas adsorbed to the substrate, and c) exposing the substrate to a hydrogen plasma, thereby reforming the thermally nitrided raw material gas.
Claims10
A film forming method, comprising:
- a) supplying raw material gas to a substrate, thereby adsorbing the raw material gas to the substrate, the raw material gas having, in a molecule thereof, a cyclic structure including a silicon atom and a carbon atom;
- b) thermally treating the substrate in an atmosphere including nitriding gas, thereby thermally nitriding the raw material gas adsorbed to the substrate;
- and
- c) exposing the substrate to a hydrogen plasma, thereby reforming the thermally nitrided raw material gas.
1 more element
A film forming apparatus, comprising:
- a process chamber;
- a gas supply configured to supply gas into the process chamber;
- and
- a controller, wherein
- the controller is configured to control the gas supply so as to, in the process chamber,
- a) supply raw material gas to a substrate, thereby adsorbing the raw material gas to the substrate, the raw material gas having, in a molecule thereof, a cyclic structure including a silicon atom and a carbon atom;
- b) thermally treat the substrate in an atmosphere including nitriding gas, thereby thermally nitriding the raw material gas adsorbed to the substrate;
- and
- c) expose the substrate to a hydrogen plasma, thereby reforming the thermally nitrided raw material gas.
6 more elements
Dependencies are inferred from the claim text.