Substrate processing method and substrate processing system

A substrate processing system, comprising:

• a substrate holder configured to hold multiple substrates;
• a substrate processing apparatus configured to process each substrate;
• a substrate transfer device configured to transfer each substrate between the substrate holder and the substrate processing apparatus;
• and
• a processing controller configured to control the substrate processing apparatus,
• wherein the substrate processing apparatus comprises:
• a substrate support configured to support the substrate;
• a chemical liquid supply configured to supply a chemical liquid to a first surface of the substrate;
• and
• a fluid supply configured to supply a heated fluid to a second surface of the substrate,
• wherein the processing controller controls the substrate processing apparatus to perform:
• processing the first surface of the substrate by the chemical liquid supplied to the first surface from the chemical liquid supply;
• and
• heating the substrate by starting a supply of the heated fluid to the second surface of the substrate prior to a start of a supply of the chemical liquid to the first surface of the substrate, and
• wherein a temperature of at least one of the chemical liquid to be supplied to the first surface or the heated fluid to be supplied to the second surface is adjusted based on a chemical liquid discharge standby time during which a discharge of the chemical liquid from the chemical liquid supply is not performed continuously.