Exposure head, calibration system, and drawing device
AssigneeInspec Inc.
InventorMasashi SUGAWARA
Life of this patent
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AssigneeInspec Inc.
InventorMasashi SUGAWARA
Estimating the term…
The exposure head is for irradiating a substrate conveyed in a predetermined direction with an exposure beam while scanning the substrate with the exposure beam in a one-dimensional manner, and the exposure head includes: a polygon mirror having multiple reflecting surfaces and provided rotatably; an optical element configured to cause the beam emitted from a light source and shaped into a beam shape to enter the polygon mirror; an imaging optical system configured to image the beam reflected by the polygon mirror onto an exposure surface of the substrate, a reflecting mirror provided insertably into or removably from the optical path of the beam shaped into the beam shape entering the optical element, the reflecting mirror being configured to reflect the beam in a direction different from the optical path while being inserted into the optical path; and a light-receiving element arranged at a position where the beam reflected by the reflecting mirror can enter the light-receiving element, and that is capable detecting an intensity of the beam.
An exposure head for irradiating a substrate conveyed in a predetermined direction with an exposure beam while scanning the substrate with the exposure beam in a one-dimensional manner, comprising:
A calibration system for calibrating an intensity of an exposure beam that is emitted from an exposure head and irradiated onto a substrate conveyed in a predetermined direction while the exposure beam is scanned in a one-dimensional manner, the exposure head including:
A drawing device, comprising:
Dependencies are inferred from the claim text.