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US 2024/0140786 A1Published application
Inattentive HF Concentration Vapors Phase Release of Micro-electro-mechanical Systems and Optical Systems
AssigneeUNM Rainforest Innovations
InventorsTito Busani, Ravi Kiran Chityala
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Abstract
A low-cost, conventional release using low concentrations of HF to overcome the stiction of MEMS structure.
Claims22
A method to release micro-electro-mechanical structure (MEMS) from a sacrificial substrate comprising the steps of:
- providing an aqueous solution comprised of a predetermined concentration of HF;
- locating said substrate a predetermined distance from said aqueous solution of HF;
- and exposing said substrate to vapors released from said aqueous solution of HF until said MEMS structure is released from said substrate.
Dependencies are inferred from the claim text.