US 2024/0133852 A1 · SELECTIVE MONITORING OF BASE CHEMICALS

Abstract

Methods for selective measurement and monitoring of multiple base chemicals in processing solutions are provided. Methods include providing a processing solution including a plurality of base chemicals and performing a first analytical method, such as measuring a conductivity of the solution blend, in combination with a second analytical method, such as titration or pH measurements of the solution. From such measurements, a concentration of one or more base chemicals can be selectively determined. In such methods, multiple bases in a same processing solution are advantageously selectively measured and monitored accurately.

Claims18

Dependent claims

A method for determining a concentration of at least one base chemical in a processing solution including a first base chemical and a second base chemical, comprising:

performing a first analytical method comprising measuring a conductivity of the processing solution to provide a first measurement;
performing a second analytical method of the processing solution to provide a second measurement;
and
determining a concentration of at least one of the first base chemical and the second base chemical based on the first and second measurements,
wherein the first base chemical is different than the second base chemical, and wherein the first analytical method is different than the second analytical method.

2 more elements

Dependencies are inferred from the claim text.

Selective monitoring of base chemicals

Life of this patent

Selective monitoring of base chemicals

Life of this patent

Abstract

Claims18