Photocurable resin composition and three-dimensional stereolithography product
AssigneeNagase Chemtex Corporation
InventorsKoji WATANABE, Tatsuya INOUE
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Abstract
Provided is a photocurable resin composition including a reactive compound, and a photopolymerization initiator. A cured product of the photocurable resin composition has two or more glass transition points including a TgA and a TgB. The TgA is less than 25° C., and the TgB is 25° C. or more. An elongation at break in accordance with ASTM D638 of the cured product of the photocurable resin composition is 130% or more, and a breaking strength in accordance with ASTM D638 of the cured product of the photocurable resin composition is 3 MPa or more.
Claims30
A photocurable resin composition, comprising:
- a reactive compound;
- and a photopolymerization initiator, wherein
- the reactive compound includes a reactive monomer and a reactive oligomer,
- a mass ratio between the reactive monomer and the reactive oligomer (=reactive monomer/reactive oligomer) is 20/80 to 70/30,
- a cured product of the photocurable resin composition has two or more glass transition points including a TgA and a TgB,
- the TgA being less than 25° C., and
- the TgB being 25° C. or more,
- the reactive compound includes a first compound and a second compound,
- a glass transition point Tg1 of a cured product of the first compound is 10° C. or less,
- a glass transition point Tg2 of a cured product of the second compound is 50° C. or more,
- the first compound includes at least a first oligomer as the reactive oligomer,
- a mass ratio between the first compound and the second compound (=first compound/second compound) is 20/80 to 85/15,
- an elongation at break in accordance with ASTM D638 of the cured product of the photocurable resin composition is 130% or more, and
- a breaking strength in accordance with ASTM D638 of the cured product of the photocurable resin composition is 3 MPa or more.
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Dependencies are inferred from the claim text.