Photomask and method of manufacturing display panel using the same

A photomask comprising:

• a base substrate;
• a lower layer disposed on the base substrate, wherein first and second main openings spaced apart from each other in a first direction are defined through the lower layer;
• an upper layer disposed on the lower layer, wherein a third main opening corresponding to the first main opening, a fourth main opening corresponding to the second main opening, a first auxiliary opening disposed between the third and fourth main openings and extending in a second direction crossing the first direction when viewed in a plan view, a second auxiliary opening spaced apart from the first auxiliary opening in the first direction with the third main opening interposed therebetween and surrounding the third main opening, and a third auxiliary opening spaced apart from the first auxiliary opening in the first direction with the fourth main opening interposed therebetween and surrounding the fourth main opening are defined through the upper layer,
• wherein the first auxiliary opening, the third main opening, and the second auxiliary opening satisfy the following Equation:
• 1≥h+s, wherein 1 denotes a length in the second direction of the first auxiliary opening, h denotes a maximum width in one of the first and second directions of the third main opening, and s denotes a separation distance in the first direction between the third main opening and the second auxiliary opening.

A method of manufacturing a display panel, the method comprising:

• preparing a preliminary display panel comprising a base layer, a conductive pattern disposed on the base layer, at least one insulating layer disposed on the conductive pattern, and a resist layer disposed on the at least one insulating layer;
• placing a photomask on the preliminary display panel, wherein the photomask comprises a first light-transmitting portion comprising first and second main patterns spaced apart from each other in a first direction, a second light-transmitting portion spaced apart from the first light-transmitting portion and having a light transmittance lower than a light transmittance of the first light-transmitting portion, and a light shielding portion surrounding the first and second light-transmitting portions;
• radiating a light to the photomask to pattern the resist layer such that first and second exposure openings are formed through the resist layer to respectively correspond to the first and second main patterns;
• and
• patterning the at least one insulating layer to form first and second contact holes through the at least one insulating layer to respectively correspond to the first and second exposure openings,
• wherein the second light-transmitting portion of the photomask comprises a first auxiliary pattern disposed between the first and second main patterns and extending in a second direction crossing the first direction, a second auxiliary pattern spaced apart from the first auxiliary pattern in the first direction with the first main pattern interposed therebetween, and a third auxiliary pattern spaced apart from the first auxiliary pattern in the first direction with the second main pattern interposed therebetween, the first auxiliary pattern, the first main pattern, and
• the second auxiliary pattern satisfy the following Equation:
• 1≥h+s, wherein 1 denotes a length in the second direction of the first auxiliary pattern, h denotes a maximum width in one of the first and second directions of the first main pattern, and s denotes a separation distance in the first direction between the first main pattern and the second auxiliary pattern.