Methods for producing an etch resist pattern on a metallic surface

A method of forming a metallic pattern on a metallic object, the method comprising:

• chemically activating a metallic object by exposing the metallic object to an aqueous solution containing an ionizing compound to form metal ions;
• after chemically activating the metallic object, printing onto the activated metallic object, in a pattern, a liquid containing a reactive component comprising an acrylic component, a phosphate component, a sulfonate component, or any combination thereof, to form an etch mask on the activated metallic object by reaction of the reactive component with the metal ions, the etch mask defining covered and uncovered portions of the metallic object;
• and
• performing an etching process to remove portions of the metallic object that are not covered by the etch mask to form the metallic pattern.

A method of forming a pattern in a metallic surface, the method comprising:

• exposing a metallic surface to an aqueous solution containing an inorganic ionizing compound to form metal ions;
• printing onto the metallic surface, in a pattern, a liquid containing a reactive component comprising an acrylic component, a phosphate component, a sulfonate component, or any combination thereof, to form an etch mask on the metallic surface by reaction of the reactive component with the metal ions, the etch mask defining covered and uncovered portions of the metallic surface;
• and
• performing an etching process to etch portions of the metallic surface that are not covered by the etch mask to form the metallic pattern.