Quantum device and its manufacturing method

A method for manufacturing a quantum device comprising:

• forming a resist mask on a substrate, the substrate including at least one conductor layer formed of a superconducting material formed therein, the resist mask being a mask for forming a Josephson junction by a first conductor formed of a superconducting material and a second conductor formed of a superconducting material;
• depositing a plurality of first conductors on the substrate, on which the resist mask has been formed, by angled evaporation performed in a first direction;
• oxidizing a surface of the first conductors and thereby forming an oxide film thereon;
• depositing at least a part of the second conductors on each of the plurality of first conductors by angled evaporation performed in a second direction, and thereby forming a Josephson junction by a part of one of the first conductors, a part of one of the second conductors, and the oxide film;
• and
• connecting the one second conductor constituting the Josephson junction to the conductor layer directly or through a conductor.