Method of manufacturing metal nitride film and electronic device including metal nitride film

A method of manufacturing a metal nitride film, the method comprising:

• placing a substrate in a reaction chamber and supplying a first source into the reaction chamber, the first source including a metal organic ligand;
• performing a first purging of removing an organic ligand not being adsorbed on the substrate, among the first source;
• supplying a second source into the reaction chamber, the second source including a halogen compound;
• performing a second purging of removing an organic ligand not reacted with the second source;
• and
• supplying a nitridant into the reaction chamber.