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US 2023/0420303 A1Published application
Enhanced power and signal for stacked-fets
AssigneeInternational Business Machines Corporation
InventorsAlbert M. Young, Albert M. Chu, Junli Wang
Life of this patent
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Abstract
A semiconductor structure including a reliable power rail in stacked field effect transistor technology with unequal device footprints is provided that mitigates, and in some cases even eliminates, shorting risks that are typically associated using long bars in advanced logic applications.
Claims19
A semiconductor structure comprising:
- a stacked field effect transistor having a top field effect transistor located above a bottom field effect transistor, wherein the bottom field effect transistor has a first channel region having a first channel width and the top field effect transistor has a second channel region having a second channel width that is different from the first channel width, and wherein the first channel region of the bottom field effect transistor and the second channel region of the top field effect transistor share a common sidewall;
- a first contact structure contacting a source/drain region of the bottom field effect transistor and extending laterally away from the common sidewall;
- and
- a power rail in electrical contact with the first contact structure.
1 more element
Dependencies are inferred from the claim text.