Substrate processing apparatus, substrate processing system, and substrate processing method
AssigneeSCREEN Holdings Co., Ltd.
InventorsKoji HASHIMOTO, Shinji SHIMIZU, Hiroshi HORIGUCHI, Masahiro YAMAMOTO
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AssigneeSCREEN Holdings Co., Ltd.
InventorsKoji HASHIMOTO, Shinji SHIMIZU, Hiroshi HORIGUCHI, Masahiro YAMAMOTO
Estimating the term…
It is an object of the present invention to reduce the amount of data used in an apparatus, a system, and a method for performing a substrate processing. In order to achieve this object, a substrate processing apparatus includes one or more processing units each for performing a processing on a substrate and one or more arithmetic processing parts. One or more arithmetic processing parts generate a flow recipe defining a flow of a series of processings for a substrate by combining two or more processing recipes among a plurality of processing recipes each defining a processing condition relating to a processing to be performed on a substrate in the one or more processing units. The plurality of processing recipes include a plurality of liquid processing recipes each defining a condition of a processing to be performed on a substrate by using a processing liquid.
A substrate processing apparatus comprising:
A substrate processing method using a substrate processing apparatus which comprises one or more processing units each performing a processing on a substrate and one or more arithmetic processing parts, comprising the steps of:
Dependencies are inferred from the claim text.