Drawing apparatus, drawing system, and drawing method

A drawing method configured to perform drawing on a substrate based on a design pattern, the drawing method comprising:

• (a) receiving surface profile data representing a surface profile of said substrate;
• (b) correcting design pattern data representing said design pattern based on said surface profile data to generate correction pattern data representing a correction pattern;
• (c) placing said substrate on a stage in a posture along a horizontal direction;
• (d) moving said stage on which said substrate has been placed and a drawing head relative to each other continuously or intermittently in said horizontal direction;
• (e) generating modulated light by a spatial light modulator included in said drawing head;
• and
• (f) irradiating said substrate with modulated light generated by said spatial light modulator controlled based on said correction pattern data while focusing said modulated light on a focus position in a height direction over said stage by a projection optical system included in said drawing head during execution of said (d) and said (e).