Photosensitive resin composition, protective layer and method for pattern formation

A photosensitive resin composition, comprising:

• an alkali-soluble resin (A);
• a sensitizer (B);
• an additive (C);
• and
• a solvent (D),
• wherein the additive (C) comprises a compound represented by Formula (C-1) as follows:
• wherein R1 represents hydrogen, hydroxyl, an alkyl group having 1 to 15 carbon atoms, a phenyl group, a phenyl group substituted by an aryl group, an acid group, an ester group, an alkylamino group, a halogen atom, a cyano group, or a combination thereof, R2 represents a group represented by Formula (C-2) as follows, and R3 and R4 each represent hydrogen or a group represented by Formula (C-3) as follows,
• wherein R5 represents hydrogen or a methyl group, m represents an integer from 0 to 300, and * represents a bonding position,
• wherein R6 represents hydrogen or a methyl group, n represents an integer from 0 to 300, and * represents a bonding position.