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US 2023/0416905 A9Published application
Film deposition system, factory system, and method of depositing film on wafer
AssigneeTDK Corporation
InventorsTsuyoshi SUZUKI, Katsuyuki NAKADA, Tomoyuki SASAKI
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Abstract
A film deposition system according to the present embodiment includes a film deposition apparatus, and a computer, in which the film deposition apparatus includes a film deposition chamber in which a plurality of deposition species are installable, and the computer includes a calculation region that calculates based on a calculation model having an Ising model or QUBO, and predict a time required for film deposition when a disposition of the deposition species is set.
Claims20
A film deposition system comprising:
- a film deposition apparatus;
- and
- a computer, wherein
- the film deposition apparatus includes a film deposition chamber in which a plurality of deposition species are installable, and
- the computer includes a calculation region that calculates based on a calculation model having an Ising model or quadratic unconstrained binary optimization (QUBO), and predicts a time required for film deposition when a disposition of the deposition species is set.
2 more elements
A factory system comprising:
- a plurality of apparatuses;
- and
- a computer, wherein
- the computer includes a calculation region that calculates based on a calculation model having an Ising model or quadratic unconstrained binary optimization (QUBO), and predicts a time required for processing when the plurality of apparatuses are disposed in a plurality of regions in which the apparatuses are installable.
1 more element
A method of depositing a film on a wafer comprising:
- a process of designing a calculation model having an Ising model or quadratic unconstrained binary optimization (QUBO) with a disposition of a plurality of deposition species in a film deposition apparatus as an element;
- a process of predicting a time required for film deposition when the deposition species are disposed on the basis of the calculation model;
- and
- a process of applying the disposition of the deposition species as a disposition of the deposition species of the film deposition apparatus when the predicted time is equal to or less than a predetermined time.
1 more element
Dependencies are inferred from the claim text.