Semiconductor memory device
AssigneeKioxia Corporation
InventorMutsumi OKAJIMA
Life of this patent
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Abstract
A semiconductor memory device includes: a memory cell array including memory cells, each including an oxide semiconductor transistor; a first insulating layer disposed above the memory cell array; a first wiring layer disposed between the memory cell array and the first insulating layer; a second insulating layer extending in a vertical direction. The second insulating layer has an annular cross-section. The semiconductor memory device includes a third insulating layer further disposed over the first insulating layer, a portion of the third insulating layer being surrounded by the second insulating layer.
Claims18
A semiconductor memory device comprising:
- a memory cell array including a plurality of memory cells, each of the memory cells including at least an oxide semiconductor transistor;
- a first insulating layer disposed above the memory cell array;
- a first wiring layer disposed between the memory cell array and the first insulating layer;
- a second insulating layer extending in a first direction from the memory cell array toward the first insulating layer, wherein
- a first distance in the first direction from a lower end of the second insulating layer to the memory cell array is less than a second distance in the first direction from the first wiring layer to the memory cell array,
- a third distance in the first direction from an upper end of the second insulating layer to the memory cell array is greater than a fourth distance in the first direction from the first insulating layer to the memory cell array, and
- the second insulating layer has an annular cross-section;
- and
- a third insulating layer further disposed over the first insulating layer, a portion of the third insulating layer being surrounded by the second insulating layer.
Dependencies are inferred from the claim text.