Semiconductor device and method for manufacturing same

A semiconductor device comprising:

• a substrate;
• a first conductivity type source region formed on a main surface of the substrate;
• a second conductivity type well region formed on the main surface of the substrate and electrically connected to the first conductivity type source region;
• a first conductivity type drift region formed on the main surface of the substrate and in contact with the second conductivity type well region;
• a first conductivity type drain region formed on the main surface of the substrate and in contact with the first conductivity type drift region;
• a first electrode electrically connected to the first conductivity type source region;
• a second electrode electrically connected to the first conductivity type drain region;
• a third electrode formed in contact with the first conductivity type source region, the second conductivity type well region, and the first conductivity type drift region through an insulating film;
• and
• a parasitic capacitance reduction region formed in contact with the first conductivity type source region and in contact with the third electrode through the insulating film, the parasitic capacitance reduction region having a higher resistance value than that of the first conductivity type source region.