Semiconductor device having nanosheets
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTe-Hsin CHIU, Kam-Tou SIO, Shang-Wei FANG, Wei-Cheng LIN, Jiann-Tyng TZENG
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AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorsTe-Hsin CHIU, Kam-Tou SIO, Shang-Wei FANG, Wei-Cheng LIN, Jiann-Tyng TZENG
Estimating the term…
Disclosed are semiconductor devices including a substrate, a first transistor formed over a first portion of the substrate, wherein the first transistor comprises a first nanosheet stack including N nanosheets and a second transistor over a second portion of the substrate, wherein the second transistor comprises a second nanosheet stack including M nanosheets, wherein N is different from M in which the first and second nanosheet stacks are formed on first and second substrate regions that are vertically offset from one another.
A semiconductor device, comprising:
A semiconductor device comprising:
A semiconductor device comprising:
Dependencies are inferred from the claim text.