A positioning system, a lithographic apparatus, an absolute position determination method, and a device manufacturing method
AssigneeASML Netherlands B.V.
InventorMaarten Jozef JANSEN
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AssigneeASML Netherlands B.V.
InventorMaarten Jozef JANSEN
Estimating the term…
The invention provides a positioning system to determine an absolute position of a moveable target relative to a reference, comprising an interferometer system with a first light source to emit light at a fixed frequency and a second light source to emit light at at least two different frequencies. The positioning system is configured to determine, based on movement of the target, a phase difference curve associated with a first frequency of the second light source and a phase difference curve associated with a second frequency of the second light source as a function of a phase difference associated with the fixed frequency of the first light source and to determine a cross-point to determine the absolute position of the moveable target. The invention also relates to a lithographic apparatus and corresponding method.
-18. (canceled)
A positioning system to determine an absolute position of a moveable target relative to a reference, comprising:
A method for determining an absolute position of a moveable target relative to a reference using an interferometer system with a first light source configured to emit a light beam at a fixed frequency and a second light source configured to emit a second light beam and is able to output the second light beam at a first frequency and at a second frequency, wherein a portion of the first light beam interacts with the moveable target and another portion of the first light beam travels along a fixed reference path, wherein a portion of the second light beam interacts with the moveable target and another portion of the second light beam travels along a fixed reference path, the method comprising:
A heterodyne interferometer system comprising:
Dependencies are inferred from the claim text.