Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device

An actinic ray-sensitive or radiation-sensitive resin composition comprising:

• a resin having a group which is decomposed by action of acid to generate a polar group,
• wherein the resin includes a repeating unit represented by General Formula (A2), and
• at least one of a requirement 1 or a requirement 2 is satisfied,
• the requirement 1:
• the actinic ray-sensitive or radiation-sensitive resin composition contains a salt represented by General Formula (1),
• the requirement 2:
• the resin has a residue formed by removing one hydrogen atom from the salt represented by General Formula (1),
• in General Formula (A2),
• R101 to R103 each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an alkyloxycarbonyl group, where R102 may be bonded to ArA to form a ring, and in this case, R102 represents a single bond or an alkylene group,
• LA represents a single bond or a divalent linking group,
• ArA represents a (k+1)-valent aromatic ring group, and
• k represents an integer of 1 to 5,
• in General Formula (1), R1's each independently represent a monovalent substituent, R2 represents an alkyl group which may have a substituent, a cycloalkyl group which may have a substituent, or an aryl group which may have a substituent, where in a case where n is 2, two R2's may be bonded to each other to form a ring, Ar represents an (l+1)-valent aromatic ring group, X represents a single bond or a divalent linking group, Y represents a sulfur atom or an iodine atom, Z− represents an anion, 1 represents an integer of 1 to 5, in a case where Y is a sulfur atom, m represents an integer of 1 to 3 and n represents 3−m, in a case where Y is an iodine atom, m represents 1 or 2 and n represents 2−m, and at least one of R1's represents an electron-withdrawing group.