Method and apparatus for optimizing a defect correction for an optical element used in a lithographic process
OwnerVladimir Dmitrievinventor
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Abstract
This invention refers to a method for optimizing a defect correction of an optical element used in a lithographic process which comprises the steps: (a) determining whether the optical element has at least one defect; (b) determining whether the optical element has at least one surface contour deformation; and (c) determining at least one pixel arrangement for writing into the optical element based on whether at least one defect has been determined and on whether at least one surface contour deformation has been determined, the at least one pixel arrangement correcting the at least one defect, the at least one surface contour deformation or both.
Claims20
A method for determining a writing depth of at least one pixel writing map written into an optical element used in a lithographic process from a surface contour deformation of the optical element, the method comprising the steps:
- a. determining a surface contour deformation induced by the at least one pixel writing map written into the optical element;
- b. simulating at least two surface contour deformations of the at least one pixel writing map for at least two different writing depths;
- and
- c. determining the writing depth of the at least one pixel writing map by comparing the determined surface contour deformation with the at least two simulated surface contour deformations.
A method for optimizing a defect correction of an optical element used in a lithographic process, the method comprising the steps:
- a. determining whether the optical element has at least one defect;
- b. determining whether the optical element has at least one surface contour deformation;
- and
- c. determining at least one pixel arrangement for writing into the optical element based on whether at least one defect has been determined and on whether at least one surface contour deformation has been determined, the at least one pixel arrangement correcting the at least one defect, the at least one surface contour deformation or both.
An apparatus for determining a writing depth of at least one pixel writing map written into an optical element used in a lithographic process from a surface contour deformation of the optical element, comprising:
- a. means for determining a surface contour deformation induced by the at least one pixel writing map written into the optical element;
- b. means for simulating at least two surface contour deformations of the pixel writing map for at least two different writing depths;
- and
- c. means for determining the writing depth of the at least one pixel writing map by comparing the determined surface contour deformation with the at least two simulated surface contour deformations.
An apparatus for optimizing a defect correction of an optical element used in a lithographic process, comprising:
- a. means for determining whether the optical element has at least one defect;
- b. means for determining whether the optical element has at least one surface contour deformation;
- and
- c. means for determining at least one pixel arrangement for writing into the optical element based on whether at least one defect has been determined and on whether at least one surface contour deformation has been determined, the at least one pixel arrangement correcting the at least one defect, the at least one surface contour deformation or both.
Dependencies are inferred from the claim text.