Pellicle membrane and method of forming the same

A method for a lithography process, comprising:

• providing a pellicle including a pellicle membrane, wherein the pellicle membrane includes at least a network of a plurality of carbon nanotubes, at least one of the plurality of carbon nanotubes including a core nanotube and a protective film surrounding the core nanotube, the protective film is silicon nitride having Si/N atomic ratio of substantially equal to 1;
• mounting the pellicle onto a photomask, wherein the photomask includes a patterned region;
• loading the photomask having the pellicle mounted thereupon into a lithography system;
• loading a semiconductor wafer onto a substrate stage of the lithography system;
• and
• performing a lithography exposure process to transfer a pattern of the patterned surface from the photomask to the semiconductor wafer.

A pellicle, comprising:

• a pellicle membrane including a network of a plurality of carbon nanotubes, at least one of the plurality of carbon nanotubes comprises a protective film surrounding the at least one of the plurality of carbon nanotubes, the protective film comprises silicon nitride having a Si/N ratio of substantially equal to 1;
• a pellicle border attached to the pellicle membrane along a peripheral region of the pellicle membrane;
• and
• a pellicle frame attached to the pellicle border.