System and method for reducing sample noise using selective markers
AssigneeKLA Corporation
InventorsGrace Hsiu-Ling Chen, Kuljit S. Virk, Martin Gruebele
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AssigneeKLA Corporation
InventorsGrace Hsiu-Ling Chen, Kuljit S. Virk, Martin Gruebele
Estimating the term…
An inspection is disclosed. The system may include an illumination source configured to illuminate a sample. The sample may include a multi-layer stack including a plurality of layers formed of a first material and at least a second material. The first material may include a light transmissive material and the second material may include light reflective material. A top layer within the stack may include absorptive markers configured to selectively bind to the top layer. The absorptive markers may be configured block light transmission through layers positioned below the top layer. The top layer may include photoluminescent markers configured to selectively bind to the light reflective material to enhance a feature of interest on the sample. The system may include detectors configured to detect photoluminescent emission emitted by the photoluminescent markers and optical elements may be configured to direct the photoluminescent emission to the detectors.
An inspection system, the inspection system comprising:
A patterned wafer, the patterned wafer comprising:
A method, the method comprising:
Dependencies are inferred from the claim text.