Monocrystalline silicon micro-nano dual-scale anti-reflection texture and preparation method therefor

Abstract

A monocrystalline silicon micro-nano dual-scale anti-reflection texture and a preparation method therefor. The preparation method combines nanosecond-laser-assisted waterjet near-damage-free processing and femtosecond laser scanning, and subsurface damage caused by a re-cast layer phenomenon and a hot crack in a monocrystalline silicon laser texturing process can be effectively reduced by combining a nanosecond-laser-assisted waterjet near-damage-free processing technology and an ultra-short pulse femtosecond laser cold processing technology; and meanwhile, a micro-scale frame structure and a nano-scale structure can be flexibly modified respectively by adjusting nanosecond-laser-assisted waterjet technological parameters and femtosecond laser technological parameters, a geometry light trapping effect and an effective dielectric effect can be achieved in a micro-nano dual-scale hybrid structure at the same time, and surface reflection is reduced.

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