Continuous low-temperature plasma powder treatment and ball-milling production device and method thereof

Abstract

Disclosed are a continuous low-temperature plasma powder treatment and ball-milling production device, and a method thereof. The device includes a powder circulating and conveying pipeline system (1), a ball mill (2), a low-temperature plasma discharge pipeline (3), a vacuum discharge system (4) and a controllable atmosphere system (5), where the powder circulating and conveying pipeline system (1) is sequentially connected to the ball mill (2) and the low-temperature plasma discharge pipeline (3) through pipelines; and the controllable atmosphere system (5) is connected to the powder circulating and conveying pipeline system (1). The powder circulating and conveying pipeline system (1) is used for circulating and conveying to-be-treated powder at a controllable air pressure and flow speed. On one hand, a double-dielectric barrier discharge structure is introduced in a powder conveying process to form the low-temperature plasma discharge pipeline (3), thereby realizing a plasma discharge treatment on a transfer material powder; and on the other hand, the ball mill (2) is introduced to perform ball-milling refining or alloying on a powder subjected to plasma discharge treatment, thereby treating the powder through a large-area, uniform and high-energy non-equilibrium plasma in cooperation with mechanical ball milling and being capable of being used for performing a surface circulating modification treatment on a conventional metal, macromolecule or oxide powder.

Dependencies are inferred from the claim text.